KTU S1

Intrinsic Semiconductors and Carrier Concentration

By the end you should be able to: Derive the densities of electrons in the conduction band and holes in the valence band, obtain the intrinsic carrier concentration, and explain its exponential variation with temperature.

The syllabus marks this one (Derivation), so the derivation is the content, not the decoration.

What an intrinsic semiconductor is

A pure semiconductor — silicon or germanium with no deliberate impurities. At absolute zero the valence band is full, the conduction band empty, and it is an insulator.

Warm it, and some electrons cross the gap. Each one that leaves the valence band leaves behind a vacancy. That vacancy is a hole, and it behaves as a mobile positive charge: a neighbouring electron slides into it, moving the vacancy the other way, and the bookkeeping is far simpler if you track the vacancy rather than the millions of electrons shuffling.

Because every conduction electron comes from the valence band,

n=p=nin = p = n_i

in a pure sample. This equality is what "intrinsic" means, and it is the step the derivation has to reach.

Density of electrons in the conduction band

Two ingredients multiply together:

  • Z(E) dEZ(E)\,dE, the density of states — how many states exist between EE and E+dEE+dE;
  • f(E)f(E), the Fermi function from Module 2 — the probability each is occupied.
n=∫EC∞Z(E)f(E) dEn = \int_{E_C}^{\infty} Z(E) f(E)\, dE

The density of states near the bottom of the conduction band, for a free electron of effective mass me∗m_e^* measured from the band edge ECE_C:

Z(E) dE=4πh3(2me∗)3/2(E−EC)1/2 dEZ(E)\,dE = \frac{4\pi}{h^{3}}\left(2m_e^{*}\right)^{3/2} (E - E_C)^{1/2}\,dE

The Fermi function simplifies. EFE_F sits near mid-gap, so for any state in the conduction band E−EFE - E_F is at least half a gap — several hundred meV, against kBT=26k_BT = 26 meV. The exponential is therefore enormous compared with 1:

f(E)=1e(E−EF)/kBT+1≈e−(E−EF)/kBTf(E) = \frac{1}{e^{(E-E_F)/k_BT}+1} \approx e^{-(E-E_F)/k_BT}

This is the Boltzmann approximation, and it is what makes the integral doable. It is valid precisely because the semiconductor is non-degenerate — lightly doped, with EFE_F well inside the gap. Dope it heavily enough that EFE_F enters a band and this step fails.

Doing the integral:

n=4πh3(2me∗)3/2∫EC∞(E−EC)1/2e−(E−EF)/kBTdEn = \frac{4\pi}{h^{3}}(2m_e^{*})^{3/2} \int_{E_C}^{\infty}(E-E_C)^{1/2}e^{-(E-E_F)/k_BT}dE

Substitute x=(E−EC)/kBTx = (E - E_C)/k_BT and pull out the constant part of the exponential:

n=4πh3(2me∗)3/2(kBT)3/2e−(EC−EF)/kBT∫0∞x1/2e−xdxn = \frac{4\pi}{h^{3}}(2m_e^{*})^{3/2}(k_BT)^{3/2} e^{-(E_C-E_F)/k_BT}\int_{0}^{\infty}x^{1/2}e^{-x}dx

The standard integral is Γ(3/2)=π/2\Gamma(3/2) = \sqrt{\pi}/2, giving

 n=2(2πme∗kBTh2)3/2e−(EC−EF)/kBT=NC e−(EC−EF)/kBT\boxed{\,n = 2\left(\frac{2\pi m_e^{*}k_BT}{h^{2}}\right)^{3/2} e^{-(E_C-E_F)/k_BT} = N_C\,e^{-(E_C-E_F)/k_BT}}

NCN_C is the effective density of states in the conduction band. The whole band has been replaced by a single equivalent level at ECE_C holding NCN_C states — a considerable simplification, and legitimate because the Boltzmann factor falls so fast that only states within a few kBTk_BT of the edge matter.

Density of holes in the valence band

Identical argument, upside down. A hole is an unoccupied state, so its probability is 1−f(E)1 - f(E), and for EE well below EFE_F:

1−f(E)≈e−(EF−E)/kBT1 - f(E) \approx e^{-(E_F-E)/k_BT}

Integrating downwards from EVE_V with effective mass mh∗m_h^{*}:

 p=2(2πmh∗kBTh2)3/2e−(EF−EV)/kBT=NV e−(EF−EV)/kBT\boxed{\,p = 2\left(\frac{2\pi m_h^{*}k_BT}{h^{2}}\right)^{3/2} e^{-(E_F-E_V)/k_BT} = N_V\,e^{-(E_F-E_V)/k_BT}}

Intrinsic carrier concentration

Multiply the two. The EFE_F terms cancel — which is the point:

np=NCNV e−(EC−EV)/kBT=NCNV e−Eg/kBTnp = N_C N_V\, e^{-(E_C-E_V)/k_BT} = N_C N_V\,e^{-E_g/k_BT}

The Fermi level has vanished. This is the law of mass action: npnp depends only on the material and the temperature, not on doping. It holds for doped semiconductors too, and it is one of the most useful results in the subject.

For an intrinsic sample n=p=nin = p = n_i, so

 ni=NCNV  e−Eg/2kBT \boxed{\,n_i = \sqrt{N_C N_V}\;e^{-E_g/2k_BT}\,}

Note the Eg/2E_g/2 — the square root halves the exponent. Forgetting it is the single most common error here.

Where the Fermi level sits

Setting n=pn = p and solving for EFE_F:

EF=EC+EV2+3kBT4ln⁡ ⁣(mh∗me∗)E_F = \frac{E_C+E_V}{2} + \frac{3k_BT}{4}\ln\!\left(\frac{m_h^{*}}{m_e^{*}}\right)

The first term is the exact middle of the gap. The second is a small correction — at 300 K it is a few meV — that vanishes if the effective masses are equal. For an intrinsic semiconductor the Fermi level lies essentially at mid-gap, and that is the answer an exam wants, with the correction quoted as the refinement.

Variation with temperature

Everything is dominated by the exponential. The T3/2T^{3/2} in NCN_C and NVN_V is real but feeble by comparison.

ni∝T3/2e−Eg/2kBTn_i \propto T^{3/2}e^{-E_g/2k_BT}

The practical consequence is dramatic, as the second worked example shows: a hundred-degree rise multiplies the carrier concentration by hundreds. This is why semiconductor resistance falls steeply with temperature, and why power devices need heat sinks — a hot device conducts more, which heats it further, which makes it conduct more still. That loop is thermal runaway, and it is a real failure mode, not a theoretical curiosity.